Symmorphix

Symmorphix develops processes and products based on unique high-quality amorphous dielectric films for physical barrier, dielectric and optical layer applications. The films are deposited using a unique, proprietary wide-area, low temperature Physical Vapor Deposition (PVD) process. Symmorphix works with strategic partners to develop specific materials and process technologies, and licenses the technology, sells the capital equipment and markets end-use products as appropriate for the specific market opportunity. Symmorphix develops applications and products based on high-quality amorphous dielectric films deposited using a unique, proprietary wide-area, low-temperature Physical Vapor Deposition (PVD) process. The wide-area processing capability (600m x 720mm) substantially reduces end product cost while low temperature deposition (<100C) enables the use of a very wide range of substrates, both organic and inorganic. The as-deposited Symmorphix film is dense, amorphous, transparent and intrinsically defect free – the hardware and process have been developed to create a film that is free of the columnar structure typical of standard vacuum thin films.